PhotoVoltaic Anti Reflective Coating Thickness Measurement
| Application |
|
|---|---|
| Wavelength | 400-950 nm (1.3-3.0 eV) |
| Accuracy | 104.5 nm (PV-ARC measurement) for 104.8 nm (Reference) SiO2 on c-Si* (thickness measurement on specular sample*) |
| Number of layers | Up to 3 layers on specular sample (depending on layers) |
| Thickness range | 10 nm ~ 30 μm depending on sample |
| Data acquisition time | < 1 s |
| Beam spot size | 1 mm (optional ~ 50 μm) |
| Focusing of beam | Manual / optional : auto-focus |
| Sample stage |
|
| Off-axis microscope | Optional |
| PC, monitor | Windows XP system with LCD monitor |
| software |
|
* certified reference material from Korea Research Institute of Standard and Science
