Engineered Metal and Dielectric Film Deposition Services
Hionix, Inc., is the provider of engineered metal and dielectric film deposition services to the semiconductor manufacturing industry. Located in Silicon Valley, Hionix aim is to serve the growing needs of thin film materials technology and deposition services of semiconductor, advanced packaging, MEMS, and flat panel display and other emerging technologies.
Specifications
Capabilities of our sputtering systems
- RF sputtering to sputter dielectrics and magnetic materials
- DC magnetron sputtering faster metal and dielectric deposition
- RF bias for sputter etching and deposition with bias
- Water Cooled table for controlled substrate temperature deposition below 40 °C
Thin film characterization and analysis
Hionix routinely uses SEM (scanning electron microscope), spectral photoreflectometer, x-ray diffraction, four point probe to characterize and analyze thin films. This is one of the many measures to monitor and control our processes and to ensure thin film quality.
Applications
200mm and smaller size wafers:
Aluminum(Al), Aluminum Oxide(Al2O3),Aluminum Copper(4%), Aluminum Copper(0.5%)Aluminum Copper(2%), AlCu(0.5%)Si(1%), Cobalt, Cobalt Iron, Chrome, Copper, Gold, Hafnium, Hafnium Oxide, ITO, Nickel, Nickel Chrome(60/40), Nickel Iron(80/20, 60/40), Nickel vanadium, Niobium, Niobium Oxide, Quartz, Ruthenium, Ruthenium Oxide, Silicon(amporphous), Silicon Carbide, Silicon oxide(SiO2), Silicon Nitride(Si3N4), Silver, Silver Oxide, Titanium, Titanium oxide(TiO2), Titanium Nitride(TiN), TiTungsten (TiW), Tantalum, Tantalum Nitride, Tantalum oxide, Tungsten, Molybdenum, Zinc Oxide(pure), Zinc Oxide(aluminum doped), Zirconium, Zirconium oxide, platinum.
300mm wafers:
Aluminum, Aluminum Oxide, Aluminum Silicon(1%), Cobalt, Copper, Nickel, Nickel Vanadium, Ruthenium, Silicon, Silicon carbide, Silicon oxide, Silicon Nitride, Silver, Tantalum, Tantalum Nitride, Tantalum oxide, Titanium, Titanium oxide, Titanium Nitride, Tungsten.
Thermal Oxide Wafer Services
Hionix offers in house dry and wet oxidation services for 2" - 12" diameter wafers.
Wet Oxidation :
2K A - 20 K A with wafer within wafer non uniformity of +/- 5% range and target thickness tolerance of +/- 10%
Dry Oxidation :
500A - 3K A with wafer within wafer unifromity of +/- 10% range and target thickness tolerance of +/- 10%.
SEM/EDAX Services
Hionix offers high magnitude and high resolution images of samples.
Silicon Wafers:
Hionix carries a large inventory of silicon wafers in 2" to 12" diameters.