Mask Cleaning
Linde EcoSnow MaskCLEAN 150™
The Eco-Snow® advanced MaskClean 150™ System removes sub-micron particles and other soft defects from photomasks. The system can be used for general mask cleaning including final clean prior to pellicle attach and post repair clean using a unique carbon dioxide (CO2) snow cleaning process. Eco-Snow cleaning is a fast, environmentally friendly, “all dry” non-contact process that offers numerous advantages over conventional wet cleaning systems.
Specifications
- Fully automated mask handling
- SMIF 200 automated load station
- Environmentally controlled Class 1 cleaning chamber
- Advanced ESD control
- Compact footprint
- Substrate temperature control
- Internal dew point monitor
- Simple facilitization
- GEM/SECS-II software
- CE marked, Semi S2, S8 compliant
Benefits
- No manual handling with mask picks
- Industry standard interface
- No change in CD or phase shift after multiple cleans
- No Sulfate or Ammonia based chemistry required
- Non-damaging clean of fragile structures
- High PRE down to nano particle size
- High throughput due to short cycle time
- High MTBF, low MTTR
Applications
- Full Mask Clean
- Post Repair Clean
- Glue removal